화학공학소재연구정보센터
학회 한국화학공학회
학술대회 2015년 봄 (04/22 ~ 04/24, 제주 ICC)
권호 21권 1호, p.13
발표분야 고분자
제목 Norbornene end-capped polyimide/mesoporous SiO2 nanocomposites exhibiting low dielectric and reduced residual stress constants
초록 In this study, a series of norbornene end-capped polyimide/mesoporous SiO2 nanocomposite films were synthesized by using a 3,3’4,4’-Benzophnonetetracarboxylic (BTDA), 4,4’-diaminodiophenyl (ODA), norbornene, and mesoporous SiO2 through thermal imidization. For mesoporous SiO2, NaSiO2 and cethyltrimethylammonium bromide (CTABr) were used to yield a defined pore which was then confirmed using wide angle x-ray diffraction (WAXD), Fourier transform infrared spectroscopy (FTIR), and transmission electron micrographs (TEM). The PI/mesoporous SiO2 composite films were successfully investigated by FTIR. The morphological structures of the PI/mesoporous SiO2 composite films were characterized by WAXD and FTIR. The 5% decomposition and glass transition temperature of PI/mesoporous SiO2 composite films were measured using thermogravimetric analysis (TGA), differential scanning calorimetry (DSC), and their residual stress behavior was investigated by thin film stress analyzer (TFSA).
저자 김태희, 이상래, 한학수
소속 연세대
키워드 Polyimide; Norbornene; End-capped; Mesoporous SiO2; Nanocomposite
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