| 초록 |
We have synthesized free-standing and oriented periodic mesoporous organosilica (PMO) film with a crystal-like wall structure grown without a solid substrate using surfactant-templated binuclear alkoxysilane precursor ((EtO)3Si-C6H4-Si(OEt)3) for the first time. The structure of the periodic pore surface results from alternating hydrophilic and hydrophobic layers, composed of silica and benzene, respectively. The PMO film has a hexagonal mesostructure, organic moiety inside the channel wall. The film-forming process works well under static conditions at 95 oC for 24 h. The PMO film, with thickness of 3.5 µm has been grown in the reactant solution. The pore diameter and surface area of the film obtained from an N2 sorption isotherm were to be determined to be 37.6 Å and 863 m2g-1, respectively. The PMO film has potential use in applications such as catalysis, sensing, separation, and conduction. |
