| 학회 |
한국고분자학회 |
| 학술대회 |
2014년 봄 (04/10 ~ 04/11, 대전 컨벤션센터) |
| 권호 |
39권 1호 |
| 발표분야 |
분자전자 부문위원회 |
| 제목 |
Preparation and gas barrier properties of Al2O3-TiO2 mixed oxide thin film with different oxides mixing ratio for organic light emitting diode encapsulation via plasma-enhanced atomic layer deposition |
| 초록 |
Organic light-emitting diodes require a passivation layer that protects the active layers from moisture and oxygen because most organic materials and electrodes are very sensitive to such gases. Passivation films for the encapsulation of organic electronic devices need excellent stability and mechanical properties. Alloys have been used as materials in ceramic and electronic fields due to their enhanced physico-chemical properties. Nano-laminate technique using plasma-enhanced atomic layer deposition (PEALD) is the one of the method to obtain alloy type thin film. We were fabricated OLED and then deposited stacks of Al2O3 and TiO2 layer in angstrom scale for OLED encapsulation using PEALD process. The properties including electrical characteristics (I-V-L), EL spectra and water vapor transmission rate were investigated. |
| 저자 |
김래호, 박선욱, 정용진, 박찬언
|
| 소속 |
포항공과대 |
| 키워드 |
nano-lamination; OLED; thin film encapsulation; PEALD; gas barrier film
|
| E-Mail |
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