| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 봄 (04/10 ~ 04/11, 컨벤션 뷰로(대전)) |
| 권호 |
33권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Preparation of ZnO nanostructure with block copolymer template and etching |
| 초록 |
ZnO is an important semiconductor material with low preparation temperature, simple structure and composition. The ZnO film is prepared on Si wafer by spin coating method. ZnO film haves uniform microstructure, low surface roughness (below nanometer scales) and high UV luminescence. It is shown that block copolymer nanopattern can form on modified ZnO surface. ZnO nanostructure was prepared by etching method. The obtained ZnO nanostructure can be integrated into nanoscale electronic and photonic devices. |
| 저자 |
Xia Guodong, 정성준, 김봉훈, 신동옥, 박승학, 이형민, 김상욱
|
| 소속 |
KAIST 신소재공학과 |
| 키워드 |
block copolymer; ZnO
|
| E-Mail |
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