| 학회 |
한국고분자학회 |
| 학술대회 |
2005년 봄 (04/14 ~ 04/15, 전경련회관) |
| 권호 |
30권 1호, p.181 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Antireflective Coating Using PS-b-PMMA Diblock Copolymer Thin Film |
| 초록 |
Antireflective coating exhibiting high transmittance (and low reflectance) in visible light wavelength was carried out by using PS-b-PMMA copolymer. To allow low refractive indices, porous PS-b-PMMA copolymer films were prepared by removing PMMA phase with UV irradiation and acetic acid rinsing. To increase the volume fraction of air (or nanoholes), homopolymers of PMMA and poly(ethylene oxide) were added to PS-b-PMMA. The nanoporous thin films coated on both side of the glass exhibited high transmittance greater than 97% at visible light region. |
| 저자 |
주원철, 박민수, 김진곤
|
| 소속 |
포항공과대 |
| 키워드 |
block copolymer; antireflection coating; nano patterning
|
| E-Mail |
|
