| 학회 |
한국고분자학회 |
| 학술대회 |
2005년 가을 (10/13 ~ 10/14, 제주 ICC) |
| 권호 |
30권 2호 |
| 발표분야 |
고분자 구조 및 물성 |
| 제목 |
Antirelfection Coating Using Polystryrene-block-poly(methyl methacrylate) Block Copolymer Thin Film |
| 초록 |
Antireflective coating exhibiting low reflectance in various wavelength region was carried out by using PS-b-PMMA copolymer. To allow low refractive indices, porous PS-b-PMMA copolymer films were prepared by removing PMMA phase with UV irradiation and acetic acid rinsing and also used block copolymer which has different volume fraction of each component. To increase the volume fraction of air (or nanoholes), homopolymers of PMMA and poly(ethylene oxide) were added to PS-b-PMMA. The nanoporous thin films coated on both side of the glass exhibited high transmittance greater than 97% at visible light region. |
| 저자 |
주원철, 박민수, 김진곤
|
| 소속 |
포항공과대 |
| 키워드 |
antireflection; block copolymer; thin film
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| E-Mail |
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