| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 봄 (04/08 ~ 04/09, 대전컨벤션센터) |
| 권호 |
35권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Universal Block Copolymer Lithography for Metals, Semiconductors, Ceramics and Polymers |
| 초록 |
Block copolymer lithography may generate device-oriented nanostructures through parallel processing. However, it has been mostly applied to silicon based materials so far. We present universal block copolymer lithography for a broad spectrum of materials including metals, semiconductors, ceramics, and polymers. Combining advanced film deposition techniques with block copolymer nanotemplates yielded the nanopatterned films of the various functional materials. The low surface roughness and sufficient surface functionality of the target functional materials were crucial for wellordered nanostructured morphology. |
| 저자 |
박석한, 정성준, 김봉훈, 신동옥, 문형석, 김상욱
|
| 소속 |
KAIST |
| 키워드 |
block copolymers; ceramics; lithography; metals; nanopatterning; semiconductors
|
| E-Mail |
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