| 초록 |
The bottom up approach using self-assembly of block copolymers for nanolithography have been considered as a powerful technique which can resolve the limitations of conventional lithograph. For practical applications of block copolymer thin films, the perpendicular orientation of phase separated microdomains with respect to the substrate is a prerequisite. However in most cases, one of the domains in the block copolymer has a preferential interaction with the substrate, so that parallel orientation is mainly induced in the thin films. To overcome the preferential interaction, we introduced thermally stable Au nanoparticles(NPs) using UV cross-linkable block copolymers which are selective and neutral to PS and PMMA to PS-PMMA block copolymer thin films. Herein, we investigated the effect of selective and neutral Au NPs on the orientation of block copolymer thin films according to the film thickness and compared the neutral window of film thickness to the neutral layer cases (PS-r-PMMA). |
