| 초록 |
A protected 4-hydroxystyrene-based polymer is generally used as a photoresist material. The purpose of this study is to synthesize and evaluate three types of 4-hydroxystyrene-based monomers as homopolymers and copolymers by anionic polymerization. Polymerization was carried out at -40°C for 3 days with an s-BuLi initiator, and the synthesized polymer was measured by GPC, DSC, and ¹H-NMR. As a result, it was confirmed that a protected 4-hydroxystyrene-based polymer having a molecular weight of about 10 kg/mol and a molecular weight distribution of 1.1 was synthesized. Finally, a poly(4-hydroxystyene) was prepared through a deprotection reaction under mild conditions. |
