| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Chemical Etching of a Triblock Copolymer of Poly(9,9-didodecyl fluorene-2,7-diyl) andPoly(D,L-lactide) |
| 초록 |
The selective chemical etching of the spin-coated films of a series of symmetric, rod-coil triblock copolymers of poly(D,L-lactide)-b-oligo(9,9-didodecyl fluorene-2,7-diyl)-b-poly(D,L-lactide) (PLA-b-PF-b-PLA) were performed in this study. To do this, the solutions of PLA-b-PF-b-PLA were prepared in various solvents and then spin-coated on the Si substrate with different rpms. The spin-coated films were dried and annealed under the atmosphere of selective solvents. The solvent-annealed films were chemically-etched by aqueous NaOH solution which selectively removed the PLA blocks of PLA-b-PF-b-PLA. The surface topologies of the spin-coated films of PLA-b-PF-b-PLA were carefully monitored by atomic force microscopy (AFM) and transmission electron microscopy (TEM). |
| 저자 |
박한선, 김민성, 고윤수, 이찬섭, 김승현, 권용구
|
| 소속 |
인하대 |
| 키워드 |
fluorene; PLA; rod-coil triblock copolymer
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| E-Mail |
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