| 초록 |
Thin films have been widely used for many electronic and optical applications. The film thickness is one of the important parameters, which influences material properties. So, our present work is to find a method for the preparation of ulltrathin polymer films for the application of optical lithography. The films were prepared from the solutions of poly(BPMA-PLMA-MMA), PMMA and poly(vinyl alcohol) blended with photosensitive materials on Si substrates by using a spin casting method. The solvents were PGMEA, cyclohexanone, and 1-methoxy-2-propanol. The effects of solvents on the film uniformity were investigated. The film thickness was measured by ellipsometry, and the morphology of film surface was characterized using an atomic force microscope. |
