| 초록 |
We demonstrated successful fabrication of nanopatterns of zinc oxide, a semiconductor, by oxygen plasma treatment of monolayer films of PS-PVP diblock copolymer micelles containing zinc chlorides. First, a monolayer film was spin-coated on silicon wafers from a toluene solution of PS-PVP micelles having zinc chlorides in the PVP core. The film showed nanopatterns of the pseudo-hexagonal array of PS-PVP micelles. By oxygen plasma, diblock copolymer micelles were completely removed from the silicon wafer, resulting in formation of pseudo-hexagonal zinc oxide nanopatterns that were oxidized from zinc chlorides located in the cores. The nanopattern showed a characteristic photoluminescence of zinc oxides at low temperatures. Nanopatterns of PS-PVP micelles and zinc oxides were also characterized using TEM, FE-SEM, and AFM |
