| 학회 |
한국고분자학회 |
| 학술대회 |
2009년 봄 (04/09 ~ 04/10, 대전컨벤션센터) |
| 권호 |
34권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Top Surface Imaging of Self-Assembled Block Copolymer |
| 초록 |
In this study, we applied the top surfacing imaging (TSI) process which is one of conventional lithography techniques to block copolymer (BCP) self-assembly. Key of TSI is silylation of the top layer in the unexposed or exposed region of photoresist film. The combined technique offers many advantages; increased O2 plasma resistance of a silylated part, decreased deformation and swelling of BCP assembled structure due to the post-treatment silyation as well as very simple and robust processing without complicated fabrication steps and expensive instruments. We used the self-assembled poly(styrene-b-acrylic acid) (PS-b-PAA) thin film driven by acid-catalyzed thermal deprotection of poly(styrene-b-tert-butyl acrylate). Silylation occurred by silicon containing materials. Nanostuctures which come from silylated PAA part were shown after O2 RIE processing. This is confirmed by AFM and SEM images and the details of evaluation will be described |
| 저자 |
김수민, 구세진, 김진백
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| 소속 |
한국과학기술원 |
| 키워드 |
Top Surface Imaging; Block copolymer
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| E-Mail |
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