| 학회 |
한국화학공학회 |
| 학술대회 |
2005년 봄 (04/22 ~ 04/23, 여수대학교) |
| 권호 |
11권 1호, p.789 |
| 발표분야 |
국제 디스플레이 산학 심포지엄 |
| 제목 |
Process Engineering of Low Temperature Chemical Bath Deposition Technique for Flexible Electronics |
| 초록 |
Chemical Bath Deposition (CBD) has been primarily used in the process of fabricating Cu (In, Ga) Se2 and CdTe based thin film photovoltaics. Normally carried out as a batch process, the most significant feature of CBD is its ability to be carried out under low temperature (near room temperature). But a major drawback of batch CBD is the formation of particles which generates a lot of waste and creates defects in devices. Moreover, it is necessary to better understand the role of particle formation and deposition in CBD thin film growth process. We have developed an impinging flow microreactor for CBD. This novel reactor provides the capability to control the homogeneous chemistry before impinging on the substrate thus helps us in differentiating the molecule-by-molecule growth from the cluster-by-cluster growth. Working Metal-Insulator Semiconductor Field Effect Transistors (MISFET) on rigid and polymeric substrates (Polyimide and PET- Poly(ethylene terephthalate) using a CBD deposited compound semiconductor channel layer were fabricated from both conventional and this new reactor. |
| 저자 |
C.-H. Chang1, Y.-J. Chang2, P. H. Mudgar1, S.-Y. Han2, D. H. Lee1, 류시옥2, 이태진1
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| 소속 |
1Department of Chemical Engineering, 2Oregon State Univ. |
| 키워드 |
Chemical Bath Deposition; Impinging Flow Microreactor; MISFET
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| E-Mail |
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| VOD |
VOD 보기 |
| 원문파일 |
초록 보기 |
