| 학회 |
한국재료학회 |
| 학술대회 |
2012년 가을 (11/07 ~ 11/09, 라카이샌드파인 리조트) |
| 권호 |
18권 2호 |
| 발표분야 |
B. 나노재료(Nanomaterials) |
| 제목 |
Effect of metal cohesion in metal-assisted chemical etching of Si with colloidal monolayer mask |
| 초록 |
The effect of metal cohesion in metal-assisted chemical etching (MaCE) of Si using colloidal monolayer mask has been systematically investigated. The morphology of Si nano/micro structures is determined by mechanical integrity (or, cohesion) of metal layer. The silver nanoparticles(AgNPs) wandering etching solution make attacked Si nano/micro structures. On the other hand, Good cohesive metal layer makes well-ordered, aligned array of Si nano/micro structures. Too good cohesive and mechanical integrity, however, has been found to have an adverse effect such as delamination during etching, due to stiff nature (flexural rigidity) of the metal layer. The observed upper limit in Ag mesh film thickness has been found to be closely related to the flexural rigidity of metal mesh film used. The findings in this work would be valuable in expanding the applicability of MaCE to the fabrication of well-ordered vertical array of Si structures for various applications. |
| 저자 |
Mi-Hwa Lee1, Dahl-Young Khang2
|
| 소속 |
1Department of Materials Science and Engineering, 2Yonsei Univ. |
| 키워드 |
Si micro-pillar; metal-assisted chemical etching; colloidal monolayer; metal cohesion
|
| E-Mail |
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