| 학회 | 한국고분자학회 |
| 학술대회 | 2005년 봄 (04/14 ~ 04/15, 전경련회관) |
| 권호 | 30권 1호, p.335 |
| 발표분야 | 고분자 합성 |
| 제목 | Synthesis and Characterization of Polysulfone with Imide Moiety for Improvement of Chemical Resistance |
| 초록 | It is well known that polysulfone is amorphous polymer with a high glass transition temperature, good thermal and oxidative stability(decomposition range between 400 and 550℃ regardless of environment-under air, argon or vacuum), excellent strength and flexibility, resistance to extremes of pH values and low creep1. But it has poor chemical resistance. So, we have an interest in the chemical modification of polysulfones to improve chemical resistance. In this work, we introduced cross-linkable moiety using chloromethylation method with imide structure for the modification of polysulfones which could be overcome above shortcomings. We prepared the cross-linked polysulfone films and improvement of their chemical resistance confirm by solubility test. The thermal properties were measured by TGA, DSC. Reference 1. A. Warshawsky, N. Kahana, A. Deshe, H. E. Gottlieb, and R. Arad-yellin, Journal of Polymer Science, 28, 2885 (1990) |
| 저자 | 이은상1, 정훈1, 홍성권2, 김용석1, 이재흥1, 원종찬1 |
| 소속 | 1한국화학(연), 2충남대 |
| 키워드 | polysulfone; imide; chloromethylation; crosslinking |
