| 초록 |
PFCs (Perfluorocarbons) for etching/cleaning gases in microelectronic or semiconductor manufacturing processes are used as CFC(ChloroFluoroCarbons) substitutes. Since PFCs are extremely stable and have long atmospheric lifetimes, PFCs are considered as greenhouse gases. Therefore, reduction technique for their emissions should be developed. PFCs compounds used in industry are mainly CF4 and C2F6. In this study, the adsorption behavior of CF4 and C2F6 on activated carbon 20∼40mesh in adsorption column was studied by breakthrough curve analysis. Effects of PFCs concentrations and flux in feed gas were investigated. Desorption curves with various N2 flow rates, feed compositions, evacuation and purge times were obtained. Besides experiments for cyclic operation were carried out at various purge flux and feed concentrations.
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