| 학회 |
한국화학공학회 |
| 학술대회 |
2011년 봄 (04/27 ~ 04/29, 창원컨벤션센터) |
| 권호 |
17권 1호, p.43 |
| 발표분야 |
고분자 |
| 제목 |
Orientation Control of Block Copolymer Thin Films on Substrateswith Well-Defined Roughness |
| 초록 |
Many recent research has focused on the fact that the perpendicular orientation of block copolymer (BCP) films is preferred over the parallel orientation when the BCP films are placed on rough surfaces. However, the quantitative and systematic analysis to investigate the effect of substrate roughness, such as period and/or amplitude of a given roughness, on the microdomain orientation of BCP films has not been fully explored yet. In the present study, we utilized various E-beam lithographic techniques to analyze the effect of substrate roughness in more systematic way. The HSQ patterns with well-defined periods and amplitudes were realized by the Atomic Image Projection E-beam Lithography. In addition, well-definedsilicon oxide patterns were also obtained using ordinary E-beam lithography. The line width and period of the patterns were finely tuned during the E-beam writing while the depth of the patterns was controlled by the reactive ion etching on the patterned substrates. On the prepared substrates, we deposited symmetric PS-b-PMMA diblock copolymers and observed the effect of individual roughness factors on the BCP thin films. |
| 저자 |
주영우, 서효선, 김현미, 조명래, 박 윤, 김기범, 차국헌
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| 소속 |
서울대 |
| 키워드 |
Block Copolymer; Roughness; E-beam Lithography; BCP Thin Films
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| E-Mail |
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| 원문파일 |
초록 보기 |
