| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 봄 (04/07 ~ 04/08, 대전컨벤션센터) |
| 권호 |
36권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Nanoporous Templates with High Aspect Ratio Using Silicon-Containing Block Copolymers and Dual Responsive Photoresists |
| 초록 |
A simple and scalable method was developed to fabricate a nanoporous template for freestanding one-dimensional nanostructure arrays based on self-assembly of silicon-containing block copolymers and a lithographic bilayer system. Removal of the cross-linked bottom layer after fabrication is not easy. Therefore, we propose a dual responsive bottom layer into which the nanopatterns of block copolymer are transferred by oxygen reactive ion etching. Because the dual responsive layer becomes cross-linked by heating, it can be used as a hard template during the etching process. It becomes soluble again by chain scission upon exposure to light. Therefore, it can be easily removed by the lift-off process. The results will be described in detail. |
| 저자 |
박창홍, 김진백, 구세진, 조경천
|
| 소속 |
한국과학기술원 |
| 키워드 |
Block Copolymer; Dual Responsive Photoresist
|
| E-Mail |
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