| 초록 |
In order to realize a well-ordered nanoporous thin films, we have successfully designed and synthesized photochemically cleavable poly(styrene-block-ethylene oxide) which bears an ortho-nitrobenzyl unit as a linker in the middle of the block copolymer. As the first step, the end-alcohol group of monomethoxy PEG was derivatized to ortho-nitrobenzyl containing alpha-bromo ester, and the resulting macroinitiator was subjected to the second PS block growing by atom transfer radical polymerization (ATRP). The resulting block copolymers showed good molecular weight and polydispersity control. Photochemical cleavage of the block copolymers was easily cleaved by simple UV-irradiation at 350 nm in both solution and solid phases. The successful and selective removal of PEO domains from a poly(styrene-block-ethylene oxide) thin film via UV-irradiation was verified by various analytical tools such as GPC, 1H-NMR, AFM, and FETEM. |
