| 학회 |
한국고분자학회 |
| 학술대회 |
2013년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
38권 2호 |
| 발표분야 |
대학원생 구두발표(발표10분) |
| 제목 |
Al2O3/TiO2 nano-laminated film deposited by plasma-enhanced atomic layer deposition for thin film encapsulation of OLED |
| 초록 |
Organic light-emitting diodes (OLEDs) have great potential for use in next-generation flat-panel display due to their many advantages, such as their fast response, ligh weight, wider viewing angles and for use with flexible displays. But it is still remain to solve the problem of short lifespan. One of the method to overcome short lifespan is that introduce the thin film encapsulation in OLEDs. We were fabricated OLED and then deposited stacks of Al2O3 and TiO2 layer with angstrom-scale for encapsulation using plasma-enhanced atomic layer deposition (PEALD) process. The properties including electrical characteristics (I-V-L), EL spectra and water vapor transmission rate were investigated. |
| 저자 |
김래호, 박세열, 박선욱, 김경훈, 정용진, 김유진, 박찬언
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| 소속 |
포항공과대 |
| 키워드 |
encapsulation; PEALD; OLED; WVTR
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| E-Mail |
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