| 학회 |
한국화학공학회 |
| 학술대회 |
2019년 봄 (04/24 ~ 04/26, 제주국제컨벤션센터) |
| 권호 |
25권 1호, p.865 |
| 발표분야 |
재료(Materials) |
| 제목 |
Synthesis, characterization and application of HFCVD fabricated WO3 thin films |
| 초록 |
In recent year, tungsten oxide (WO3) films are of great importance in technological applications due to its excellent chemisorption ability. WO3 thin films are increasingly being explored as an effective gas sensing electrode owing to its selectivity towards toxic gases such as NH3, SO2, H2S etc. In this study WO3 thin film was synthesized by hot filament assisted chemical vapor deposition (HFCVD) technique and utilized as efficient sensing electrode for the detection of toxic gases. In a typical experiment, the parent material Tungsten (W) was subjected to oxidation and subsequent gasification of WO3 occurred at high temperature (~1000 - 1700oC). The oxide layer then condensed onto a substrate which resulted in the formation of WO3 thin film. The structural, morphological and compositional properties of the synthesized films would be investigated using different characterization techniques. The prepared WO3 thin films based sensing electrode could be applied for the possible detection of toxic gases such as nitrogen dioxide (NO2). |
| 저자 |
Godbole Rhushikesh1, 신형식1, 사디아아민2
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| 소속 |
1전북대, 2Advanced Materials and Devices Laboratory |
| 키워드 |
재료 |
| E-Mail |
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| 원문파일 |
초록 보기 |
