| 학회 |
한국고분자학회 |
| 학술대회 |
2010년 봄 (04/08 ~ 04/09, 대전컨벤션센터) |
| 권호 |
35권 1호 |
| 발표분야 |
기능성 고분자 |
| 제목 |
Synthesis and Characterization of Porogen-Bridged Silsesquioxane Polymers for Ultralow Dielectric Films |
| 초록 |
We synthesized novel porogen-bridged silsesquioxane polymers for ultralow dielectric films with k＜2.2. Generally at high porosities above 20% required for k＜2.2, it has been difficult to obtain isolated nanoporous structures by the conventional porogen blending method. It was expected that pore interconnection could be suppressed by fixing the two ends of molecules to the matrix polymer. We synthesized silsesquioxane based terpolymers with methyltrimethoxysilane, alkyl bridged silane and porogen-bridged silane comonomers through sol-gel reaction. As a result, ultralow-k films were successfully prepared, and the detailed pore structures and physical properties of such ultralow-k films will be presented. |
| 저자 |
장성신1, 심재환1, David. W. Gidley2, Christopher L. Soles3, 윤도영1
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| 소속 |
1서울대, 2Univ. of Michigan, 3National Institute of Standards and Technology |
| 키워드 |
Ultralow dielectric films; Nanoporous organosilicate; Silsesquioxane; Porogen
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| E-Mail |
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