| 학회 | 한국고분자학회 |
| 학술대회 | 2004년 가을 (10/08 ~ 10/09, 경북대학교) |
| 권호 | 29권 2호, p.461 |
| 발표분야 | 고분자 합성 |
| 제목 | Preparation and Characterization of Cross-linked Polysulfone Film for Chemical-Resistance via Chloromethylation Method using Methacrylic Acid |
| 초록 | Polysulfone (PSf) is amorphous polymer which possesses excellent thermal stability and good optical properties1. But it has drawbacks such as poor chemical resistance and gas barrier property. In this work, we introduced crosslinkable moiety using chloromethylation method for the modification of polysulfone which could be overcome above shortcomings for display plate based on plastic film. We prepared photosensitive polysulfone having methacrylic acid moiety2 from chloromethylated polysulfone (CMPSf). It was confirmed that the reaction was almost quantitatively from the 1H-NMR spectra (Fig. 1.). The thermal, mechanical and gas barrier properties were measured by TGA, DSC, UTM and MOCON test method (Permatran W3/31). DSC analysis of polysulfone methylene methacrylate (PSfMM) was showed in improving thermal behaviors than that of PSf (Fig. 2.). Fig. 1. 1H-NMR spectra of PSf and PSfMM Fig. 2. DSC Thermograms of PSf and PSfMM Reference 1. E. Avram, M. A. Brebu, and A. Warshawsky, Polym. Degrad. Stab., 69, 175 (2000) 2. A. Zhang, X. Li, and C. Nah, J. Polym. Sci. Part A : Polym. Chem., 41, 22 (2003) |
| 저자 | 이은상1, 김용석1, 홍성권2, 김인선3, 이재흥1, 원종찬1 |
| 소속 | 1한국화학(연), 2충남대, 3(주)아이컴포넌트 |
| 키워드 | polysulfone; chloromethylation; methacrylic acid; display |
