| 초록 |
In comparison with typical dry etching methods, metal-assisted chemical etching (MaCE) is a very simple, low-cost, and large-area applicable technique to realize fine structure without any requirement of complex equipments. Even though MaCE has been actively used to fabricate nano-scale structures based on these merits, creating macro- or micro-scale structures with high-aspect ratio over large area has still difficulties. Specifically, known problems are the dissolution or damage of catalytic metal layer for the case of Ag, and limited diffusion rate of etchants and etching by-products for Au catalyst. Based on combinatorial experiments on different metal catalysts and their thicknesses, optimal conditions have been found to be Ag/Au bi-metallic structure. Further, another capping layer has been found to be essential for the success of macro- or micro-scale patterning of Si by the MaCE method. The method developed in this work can extend the application of MaCE to various fields such as microelectrochemical system (MEMS), biosensors, and microfluidics, etc.. |
