| 초록 |
Self-assembly of nanometer scale patterns is currently of interest as a method for improving throughput and resolution in nanolithography. Block copolymer (BCP) self-assembly is a cost-effectiveness, fine resolution and scalability for the densely packed periodic arrays of nanometer scale with typical length scale of 10-50nm. But typically, self-assembled BCP nanostructure possess only short-range order. Long-range ordered and defect-free nanostructures in BCP thin films are achievable by directed self-assembly upon prepatterned substrates such as chemically and topographic patterned. In this work, we describe the design of a topographic template with hexagonal and square pattern, the electron beam lithography to produce the template, and controlling the self-assembly of BCP thin films. We investigate self-assembled BCP domain structure on topographic patterned. In particular, we focus on the long-range order and density multiplication of topographic patterns. |
