| 초록 |
The directed self-assembly (DSA) of block copolymers (BCPs) has been suggested as a promising nanofabrication solution. However, further improvements of both the pattern quality and manufacturability remain as critical challenges. Although the use of BCPs with a large Flory-Huggins interaction parameter (χ) has been suggested as a potential solution, this practical self-assembly route has yet to be developed due to their extremely slow self-assembly kinetics. In this study, we report that warm solvent annealing (WSA) can markedly improve both the self-assembly kinetics and pattern quality. We suggest a means of avoiding the undesirable trade-off between the quality and formation throughput of the self-assembled patterns, which is a dilemma which arises when using the conventional solvent vapor treatment. We also provide self-consistent field theory (SCFT) simulation results to elucidate the mechanism of the pattern quality improvement realized by WSA. |
