| 초록 |
The UV assisted imprinting of photosensitive sol-gel precursor created large-area ZnO topographic patterns with various pattern shapes in a single-step process. This straightforward approach provided a smooth line edge and high thermal stability of the imprinted ZnO pattern, which are greatly advantageous for further graphoepitaxial block copolymer assembly. According to the ZnO pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of ZnO trench depth enabled by nanoimprint, generated complex hierarchical nanopatterns, where surface parallel and surface perpendicular nanocylinder arrays were alternately arranged. The stability of this complex morphology was confirmed by self-consistent field theory (SCFT) calculation. |
