| 학회 |
한국고분자학회 |
| 학술대회 |
2012년 가을 (10/11 ~ 10/12, 창원컨벤션센터) |
| 권호 |
37권 2호 |
| 발표분야 |
고분자가공/복합재료 |
| 제목 |
Directional Self Assembly of Block Copolymer in Metal Oxide Template via Multilevel Nanoimprint Lithography |
| 초록 |
The UV assisted imprinting of photosensitive sol-gel precursor created large-area metal oxide topographic patterns with various pattern shapes in a single-step process. This straightforward approach provided very low line edge roughness and high thermal stability of the imprinted metal oxide pattern, which are greatly advantageous for further graphoepitaxial block copolymer assembly. According to the metal oxide pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of metal oxide trench depth enabled by nanoimprint, generated complex hierarchical nanopatterns, where surface parallel and surface perpendicular nanocylinder arrays were alternately arranged. The stability of this complex morphology was confirmed by self-consistent field theory (SCFT) calculation. |
| 저자 |
문정호, 신동옥, 문형석, 김주영, 진형민, 최영주, 차승근, 김상욱
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| 소속 |
한국과학기술원 |
| 키워드 |
Nanoimprint; Block Copolymer; Directed Assembly
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| E-Mail |
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