| 학회 | 한국고분자학회 |
| 학술대회 | 2005년 가을 (10/13 ~ 10/14, 제주 ICC) |
| 권호 | 30권 2호 |
| 발표분야 | 고분자 구조 및 물성 |
| 제목 | Fabrication of Nanoporous Films and Nanopost Arrays from Asymmetric PS-b-PMMA Diblock Copolymers on the Neutral Self-Assembled Monolayers |
| 초록 | Much of research on thin block copolymer films has been devoted on understanding and controlling nanostructural and topological features on substrates such as silicon wafer. Especially, fabrication of thin films with vertically aligned cylindrical domains on substrates has attracted much interest due to applicability as a template for high-density electronic devices. We fabricated thin films of asymmetric polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) on self-assembled monolayers (SAMs) of 3-(p-methoxyphenyl)propyltrichlorosilane (MPTS) on silicon wafers. Molecular weights of PS-b-PMMA were 46.8kg/mol-18.0kg/mol and 20.2kg/mol-50.5kg/mol. PS(46.8k)-b-PMMA(18.0k) had hexagonally ordered PMMA cylindrical nanodomains in PS matrix, while PS(20.2k)-b-PMMA(50.5k) had PS cylinders in continuous PMMA. Since MPTS SAMs had no preferential affinity to PS and PMMA blocks, cylindrical nanodomains of PMMA or PS were oriented perpendicular to the substrate. By selective removal of PMMA domains with UV irradiation and subsequent washing, nanoporous PS films and PS nanopost arrays were produced. (a) (b) Figure 1. Schematics and FE-SEM images: (a) nanoporous PS film; (b) PS nanopost arrays |
| 저자 | 박대호1, 장재준2, 손병혁2, 정진철1, 진왕철1 |
| 소속 | 1포항공과대, 2서울대 |
| 키워드 | block copolymer; PS-b-PMMA; self-assembled monolayer |
