| 학회 |
한국화학공학회 |
| 학술대회 |
2009년 봄 (04/23 ~ 04/24, 광주 김대중컨벤션센터) |
| 권호 |
15권 1호, p.1188 |
| 발표분야 |
나노공정 및 나노소자기술(이홍희 교수 은퇴기념) |
| 제목 |
Microstructure and Nanoelectronic Device/Patterning Applications of Organosilicate Polymers |
| 초록 |
Organosilicate polymers such as poly(hydridosilsesquioxane) (PHSQ) and poly(methylsilsesquioxane) (PMSQ) have become of serious interest due to their applications as low-dielectric materials for interconnects and e-beam resist materials for nanopatterning. However, they have serious shortcomings in key properties, due to the poor understanding of their structure-property relationships. We have delineated the key structural characteristics which are responsible for the critical properties of organosilicate polymers and consequently developed novel organosilicate polymers which exhibit significant improvements over the previously available materials. They allow the preparation of ultralow-dielectric (k＜2) films with satisfactory mechanical and nanoporousmorphology characteristics, and also improved e-beam resist materials better thanPHSQ for patterning nanoelectronic devices with critical dimensions ＜20 nm. |
| 저자 |
윤도영 |
| 소속 |
서울대 |
| 키워드 |
organosilicate polymers; low-dielectric; e-beam resist; PHSQ; PMSQ
|
| E-Mail |
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| VOD |
VOD 보기 |
| 원문파일 |
초록 보기 |
