| 학회 |
한국화학공학회 |
| 학술대회 |
1997년 가을 (10/24 ~ 10/25, 충남대학교) |
| 권호 |
3권 2호, p.2941 |
| 발표분야 |
이동현상 |
| 제목 |
일정한 열선속을 가진 경사판위를 흐르는 증발액막의 안정성 해석 |
| 초록 |
The stability of thin film with free surface is of importance to many processingarising in the fields of chemical and mechanical engineering. Nonisothermal films havebeen focused for a number of years because thin evaporating liquid film providesexcellent removal of heat on the hot solid surfaces due to its high transfer surfaceof heat and mass in comparison with the volume of the thorough-flow film. Thepresent study is devoted to the mechanisms of the film flow down an inclined platewith constant heat flux. Long wave approximation is applied by deriving anevolution equation for two dimensional disturbances. Numerical analysis for thenonlinear stability is compared by the Crank-Nicolson scheme using Newton-Raphsoniteration and Fourier-Spectral method.
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| 저자 |
이재성, 김효, 김덕찬
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| 소속 |
서울시립대 화학공학과 |
| 키워드 |
stability; evaporating; heat flux
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| E-Mail |
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| 원문파일 |
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