| 초록 |
We report new fabrication methods of nanostructural materials using selective atomic layer deposition (ALD) and soft lithography. ALD is a gas-phase thin film deposition method by using self-terminating surface reactions. During the past decade, the ALD has attracted considerable attention as a method manufacturing high-quality thin films and producing tailored molecular structures.[18-20] The ALD method relies on sequential saturated surface reactions which result in the formation of a monolayer in each sequence. The successive self-terminating growth mechanism in the ALD inherently eliminates gas phase reactions. Elimination of gas phase reaction results in emphasizing the importance of surface reaction. Since the ALD process is very sensitive to surface conditions of the substrates, it offers an ideal method for selective deposition of thin films on templates. Among existing patterning methods, soft lithography is the most efficient method to fabricate new types of structures and devices on planar, curved or flexible substrates at low cost. Soft lithography includes a number of nonphotolithographic techniques that use a patterned elastomer (primarily polydimethylsiloxane) as a stamp, mold, or mask to transfer the pattern to substrates. Here, I describe the procedures for these techniques and their applications in micro- and nanofabrication, material science, optics, MEMS, and mircoelectronics. I also present issues and problems in these techniques that remain to be solved. |
