| 초록 |
In this work we have investigated new photosensitive compounds and their cross-linked films for various photonic applications. The monomers were synthesized via nucleophilic aromatic substitution from ethoxyethanol followed by the reaction with acryloyl chloride. The structure of photosensitive compounds were characterized by 1H, 19F, and 13C NMR, and FT-IR spectroscopies. The films were fabricated by spin-coating and cross-linked by photo and thermal curing in the presence of photoinitiator. They have a good chemical and mechanical resistance as well as a high thermal stability. The refractive indexes of these crosslinked films were found to range from 1.51 to 1.58 at 23.8 oC and other optical characteristics of these fluoroacrylated polymers are under progress. |
