| 학회 |
한국고분자학회 |
| 학술대회 |
2011년 가을 (10/06 ~ 10/07, 김대중 컨벤션센터) |
| 권호 |
36권 2호 |
| 발표분야 |
고분자가공/복합재료－나노카본 고분자 복합필름 |
| 제목 |
Formation of Large-Area Nitrogen-Doped Graphene Film Prepared from Simple Solution Casting of Edge-Selectively Functionalized Graphite and Its Electrocatalytic Activity |
| 초록 |
‘Pristine‘ graphite is edge-selectively functionalized with 4-aminobenzoic acid by a “direct” Friedel-Crafts acylation reaction in a polyphosphoric acid/phosphorous pentoxide medium to produce 4-aminobenzoyl edge-functionalized graphite (EFG). The EFG is readily dispersible in N-methyl-2-pyrrolidone (NMP). Subsequent solution-casting leads to the formation of large-area graphene film on a silicon wafer. The film shows sheet resistances of 60 and 200 Ω/sq, respectively, before and after heat-treatment at 900 °C in argon atmosphere. Upon the heat-treatment, the EFG film becomes N-doped graphene (N-graphene) film to display outstanding electrocatalytic activity for oxygen reduction reaction (ORR). |
| 저자 |
전인엽1, Dingshan Yu2, 배서윤1, 최현정1, 장동욱1, Liming Dai2, 백종범1
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| 소속 |
1울산과학기술대, 2Case Western Reserve Univ. |
| 키워드 |
Graphene; N-doping; electrocatalytic activity
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| E-Mail |
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