| 학회 |
한국고분자학회 |
| 학술대회 |
2008년 가을 (10/09 ~ 10/10, 일산킨텍스) |
| 권호 |
33권 2호 |
| 발표분야 |
분자전자소재 및 소자기술의 현황(분자전자 부문위원회) |
| 제목 |
Patterning of Conducting Polymer Architectures on Flexible Substrates Using Vapor Deposition Polymerization Mediated Inkjet Printing |
| 초록 |
Polyaniline (PANI) has been successfully patterned on various flexible substrates using vapor deposition polymerization-mediated inkjet printing method. Uniform and complex conducting polymer patterns are obtained via oxidation polymerization of vaporized monomer on the inkjet-printed oxidant patterns. The patterned lines are readily controlled by inkjet printing with the high resolution of micrometer scale. FT-IR attenuated total reflection analysis was conducted in order to confirm the polymerization of aniline monomer. The minimum width of patterned line was ca. 80 μm and the film thicknesses of patterned PANI were controlled from ca. 500 nm to ca 1.7 μm by monomer vaporization time. The sheet resistance of patterned line films was measured as a function of patterned line width. The lowest sheet resistance was ca. 5.7 × 103 Ω/□ over than the width of ca. 500 μm and film thickness of ca. 1.5 μm. |
| 저자 |
조준혁, 장정식
|
| 소속 |
서울대 |
| 키워드 |
patterning; polyaniline; vapor deposition polymerization; inkjet
|
| E-Mail |
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