| 학회 | 한국화학공학회 |
| 학술대회 | 2010년 봄 (04/22 ~ 04/23, 대구 EXCO) |
| 권호 | 16권 1호, p.13 |
| 발표분야 | 고분자 |
| 제목 | Order-to-Disorder Transitionof Polystyrene-b-Poly(methyl methacrylate) Films on Neutral Surface |
| 초록 | The physical properties ofblock copolymer (BCP)in confined geometries are different from bulk states polymers due to the significant influences of interfaces. As the interfacial interactions can control the microdomian orientations of block copolymers in the films, the balanced interfacial interactions can also have an effect on order-disorder transition (ODT) not to mention of the difference in bulk ODT, which determines whether the phase is homogeneously mixed or separated. We investigated ODT behaviors of a symmetric polystyrene-b-poly(methyl methacryltate) (PS-b-PMMA) block copolymer films on a neutrally modified substrate which exhibit no preferential interactions with both block components. The thickness dependence of transition temperatures for PS-b-PMMA films will be discussed by in-situ grazing incidence small angle x-ray scattering (GISAXS). |
| 저자 | 김은혜1, 류두열1, 최승훈1, 이용훈1, Thomas P. Russell2 |
| 소속 | 1연세대, 2Department of Polymer Science & Engineering |
| 키워드 | block copolymer; transition behavior; film; neutral surface |
| 원문파일 | 초록 보기 |
