| 초록 |
Nanosphere lithography is a widespread technique for the patterning on the substrate. There are many ways to form the monolayer using the nanosphere lithography (NSL), such as: drop coating, spin coating, tilted evaporation and so on. In this work we have been established a new way to form the monolayer as the result of NSL. This tehnique is quite simple, easy and time effective, and the main advantage is that it gives large troughput to form a large scale monolayer. Surface tension between the substrate and the liqiud is the main driving force to form this kind of monolayer. In this work we also apply this technique to make the different sized patterns on the upper layer of the gallium nitride based light emitting diode (LED). the polystyrene monolayer formed by new NSL is used as mask to form the pattern. The characteristics of that patterned LEDs have been investigated. All of the characteristics, i.e. photoluminescence, current-voltage are enhanced for the patterned LEDs compared with the conventional LED. |
