| 학회 |
한국재료학회 |
| 학술대회 |
2011년 가을 (10/27 ~ 10/29, 신라대학교) |
| 권호 |
17권 2호 |
| 발표분야 |
B. Nanomaterials and Processing Technology(나노소재기술) |
| 제목 |
Non-mechanical compression barrier in Langmuir-Blodgett technique for large area colloidal monolayer formation |
| 초록 |
Non-mechanical, compression barrier that uses self-assembled surfactant molecules has been demonstrated for the preparation of highly crystalline colloidal monolayer on water and on substrate. While a mechanical barrier is used to compress and thus form ordered colloidal monolayer on liquid in conventional Langmuir-Blodgett technique, randomly and sparsely floated colloidal particles on liquid have been found to be compressed and thus form highly crystalline monolayer due to surface pressure exerted by self-assembled surfactant molecules, which can be transferred onto solid substrate and processed further. The technique is shown to be applied for the preparation of well-ordered colloidal monolayer on large area substrate, up to 4” wafer in this work. Various aspects of the process have been analyzed and will be presented. Also, the fabrication of dense, high aspect ratio Si micro-pillar array using the colloidal monolayer as an etch mask will be presented. |
| 저자 |
Ui Yeon Kim1, Dahl-Young Khang2
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| 소속 |
1Department of Materials Science and Engineering, 2Yonsei Univ. |
| 키워드 |
Langmuir-Blodgett; Colloidal monolayer; surfactant; self-asembly
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| E-Mail |
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