| 초록 |
In the last decade, there has been intensive research conducted on self-assembled nanostructures because of their potential for a variety of applications in nanotechnology, particularly for nanoscale device fabrication as an alternative or a complimentary approach to the traditional top-down lithographical method. One of the promising candidates to offer a controllable nanostructure is a blolck copolymer system, which can provide the controllability of the size, morphology, and chemical nature of nanostructures. In this presentation, block copolymers in a form of micelles or thin films will be discussed to produce controlled nanostructures. It will be also demonstrated that the nanostructure of micelles and thin films of block copolymers can be combined not only with functional materials of nanoparticles, quantum dots, and fluorophores, but also with patterning and confining methods to produce nanomaterials and their arrays which cannot be easily obtained with a conventional approach. |
