화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Applied Chemistry for Engineering, Vol.25, No.1, 53-57, February, 2014
Export Citation
전기화학적 마이크로머시닝 기술을 이용한 균일한 니오븀 표면 에칭 연구
Homeogenous Etched Pits on the Surface of Nb by Electrochemical Micromachining
김경민, 유현석, 박지영, 신소운, 최진섭†
  • 인하대학교 화학공학과
Kyungmin Kim, Hyeonseok Yoo, Jiyoung Park, Sowoon Shin, and Jinsub Choi†
  • Department of Chemical Engineering, Inha University, Icheon 402-751, Korea
E-mail:
초록
본 연구에서는 micro-contact printing을 통하여 니오븀 호일 표면 위에 균일한 에칭 pits를 형성하였다. 균일한 보호층을 형성하고자 전해연마의 효과를 확인하였으며, 기존의 O2 플라즈마 공정 없이 손쉽게 균일한 에칭 pits를 형성시킬 수 있는 조건을 확인하였다. 메탄올 혼합 전해질을 사용하여 10 min 동안 에칭을 진행한 결과 니오븀 호일 표면 위에 지름과 간격이 각각 10 μm와 5 μm로 잘 정렬된 에칭 pits를 관찰하였다.
We describe the preparation of highly-ordered etching pits on the Nb foil through a micromachining. The effects of electrochemical polishing on the formation of uniformly-patterned protective epoxy layer was investigated. Unlike the previous process using O2 plasma, well-ordered etched pits were prepared without any dry processes. As a result, the Nb foil with the well-ordered pits of 10 μm × 5 μm could be obtained by electrochemical etching in methanolic electrolytes for 10 min.
Keywords:electrochemical etching;Nb etching;micro-contact printing;epoxy
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