Submicron patterns of block copolymers were generated using an elastomeric mold against solutions of block copolymers. To prevent the swelling of the elastomeric mold by the solvent used in the block copolymer solution, a thin layer of amorphous fluorinated polymer was coated on the surface of the mold. The comparison of patterns generated using an unmodified mold with those generated using a modified mold is also reported. Coupled with their microphase separation at nanometer scale, these block copolymer patterns can be applied in nanofabrication as nanotemplates.