Journal of the Korean Industrial and Engineering Chemistry, Vol.20, No.4, 402-406, August, 2009
질소 상압플라즈마를 이용한 TiO2 박막의 표면개질 및 광활성 평가
Surface Modification of TiO2 Thin Films by N2 Atmospheric Plasma and Evaluation of Photocatalytic Activity
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초록
상압플라즈마 공정을 이용하여 TiO2 박막의 표면을 개질하고 광촉매 활성을 평가하였다. TiO2 박막은 TiO2 졸-겔 용액에서 유리판에 dip-coating법으로 코팅한 후 소성 온도와 소성 시간을 변화시켜 가면서 제조하였다. 표면 개질에 사용된 플라즈마는 질소 플라즈마였으며,방전전력,처리시간 등의 공정변수를 변화시키면서 실험을 수행하였다. 광촉매 활성은와UV-A와 형광등 하에서의 메틸렌 블루 분해효율을 바탕으로 평가하였다. XPS 분석 결과, 박막의 표면에 소량의 질소가 도핑되었음을 알 수 있었으며, 광촉매효율은와UV-A와 형광등 하에서 모두 증가하였고, 특히 형광등 하에서 좀 더 증가하였다.
TiO2 thin films were surface-modified with atmospheric plasma and their photocatalytic activities were evaluated. The films were deposited on glass plates by dip-coating in a TiO2 sol-gel solution and sintered at various temperatures for various times. Nitrogen plasma was used for the modification and the experiments were carried out varying operational parameters such as discharge power and treatment time. Photocatalytic activity was evaluated based on the degradation efficiency of methylene blue (MB) under irradiation of UV-A and fluorescent light. According to XPS analysis, a little amount of nitrogen was found to be doped in the film surface after the modification. As a result, photocatalytic activity increased under irradiation of UV-A and fluorescent light, especially fluorescent light.
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