검색결과 : 11건
No. | Article |
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1 |
How and why does willow biochar increase a clay soil water retention capacity? Rasa K, Heikkinen J, Hannula M, Arstila K, Kulju S, Hyvaluoma J Biomass & Bioenergy, 119, 346, 2018 |
2 |
Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films Palomakia T, Wester N, Johansson LS, Laitinen M, Jiang H, Arstila K, Sajavaara T, Han JG, Koskinen J, Laurila T Electrochimica Acta, 220, 137, 2016 |
3 |
Impact of process and geometrical parameters on the electrical characteristics of vertical nanowire silicon n-TFETs Vandooren A, Leonelli D, Rooyackers R, Arstila K, Groeseneken G, Huyghebaert C Solid-State Electronics, 72, 82, 2012 |
4 |
Integration of Vertical Carbon Nanotube Bundles for Interconnects Chiodarelli N, Kellens K, Cott DJ, Peys N, Arstila K, Heyns M, De Gendt S, Groeseneken G, Vereecken PM Journal of the Electrochemical Society, 157(10), K211, 2010 |
5 |
Atomic layer deposition of tungsten(III) oxide thin films from W-2(NMe2)(6) and water: Precursor-based control of oxidation state in the thin film material Dezelah CL, El-Kadri OM, Szilagyi IM, Campbell JM, Arstila K, Niinisto L, Winter CH Journal of the American Chemical Society, 128(30), 9638, 2006 |
6 |
HfO2 films grown by ALD using cyclopentadienyl-type precursors and H2O or O-3 as oxygen source Niinisto J, Putkonen M, Niinisto L, Arstila K, Sajavaara T, Lu J, Kukli K, Ritala M, Leskela M Journal of the Electrochemical Society, 153(3), F39, 2006 |
7 |
Gadolinium oxide thin films by atomic layer deposition Niinisto J, Petrova N, Putkonen M, Niinisto L, Arstila K, Sajavaara T Journal of Crystal Growth, 285(1-2), 191, 2005 |
8 |
Radical-enhanced atomic layer deposition of metallic copper thin films Niskanen A, Rahtu A, Sajavaara T, Arstila K, Ritala M, Leskela M Journal of the Electrochemical Society, 152(1), G25, 2005 |
9 |
Atomic layer deposition of molybdenum nitride thin films for Cu metallizations Alen P, Ritala M, Arstila K, Keinonen J, Leskela M Journal of the Electrochemical Society, 152(5), G361, 2005 |
10 |
Low-temperature deposition of aluminum oxide by radical enhanced atomic layer deposition Niskanen A, Arstila K, Ritala M, Leskela M Journal of the Electrochemical Society, 152(7), F90, 2005 |