화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 How and why does willow biochar increase a clay soil water retention capacity?
Rasa K, Heikkinen J, Hannula M, Arstila K, Kulju S, Hyvaluoma J
Biomass & Bioenergy, 119, 346, 2018
2 Characterization and Electrochemical Properties of Oxygenated Amorphous Carbon (a-C) Films
Palomakia T, Wester N, Johansson LS, Laitinen M, Jiang H, Arstila K, Sajavaara T, Han JG, Koskinen J, Laurila T
Electrochimica Acta, 220, 137, 2016
3 Impact of process and geometrical parameters on the electrical characteristics of vertical nanowire silicon n-TFETs
Vandooren A, Leonelli D, Rooyackers R, Arstila K, Groeseneken G, Huyghebaert C
Solid-State Electronics, 72, 82, 2012
4 Integration of Vertical Carbon Nanotube Bundles for Interconnects
Chiodarelli N, Kellens K, Cott DJ, Peys N, Arstila K, Heyns M, De Gendt S, Groeseneken G, Vereecken PM
Journal of the Electrochemical Society, 157(10), K211, 2010
5 Atomic layer deposition of tungsten(III) oxide thin films from W-2(NMe2)(6) and water: Precursor-based control of oxidation state in the thin film material
Dezelah CL, El-Kadri OM, Szilagyi IM, Campbell JM, Arstila K, Niinisto L, Winter CH
Journal of the American Chemical Society, 128(30), 9638, 2006
6 HfO2 films grown by ALD using cyclopentadienyl-type precursors and H2O or O-3 as oxygen source
Niinisto J, Putkonen M, Niinisto L, Arstila K, Sajavaara T, Lu J, Kukli K, Ritala M, Leskela M
Journal of the Electrochemical Society, 153(3), F39, 2006
7 Gadolinium oxide thin films by atomic layer deposition
Niinisto J, Petrova N, Putkonen M, Niinisto L, Arstila K, Sajavaara T
Journal of Crystal Growth, 285(1-2), 191, 2005
8 Radical-enhanced atomic layer deposition of metallic copper thin films
Niskanen A, Rahtu A, Sajavaara T, Arstila K, Ritala M, Leskela M
Journal of the Electrochemical Society, 152(1), G25, 2005
9 Atomic layer deposition of molybdenum nitride thin films for Cu metallizations
Alen P, Ritala M, Arstila K, Keinonen J, Leskela M
Journal of the Electrochemical Society, 152(5), G361, 2005
10 Low-temperature deposition of aluminum oxide by radical enhanced atomic layer deposition
Niskanen A, Arstila K, Ritala M, Leskela M
Journal of the Electrochemical Society, 152(7), F90, 2005