화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 RF plasma MOCVD of Y2O3 thin films: Effect of RF self-bias on the substrates during deposition
Chopade SS, Barve SA, Raman KHT, Chand N, Deo MN, Biswas A, Rai S, Lodha GS, Rao GM, Patil DS
Applied Surface Science, 285, 524, 2013
2 Investigations of the hydrophobic and scratch resistance behavior of polystyrene films deposited on bell metal using RF-PACVD process
Choudhury AJ, Barve SA, Chutia J, Pal AR, Chowdhury D, Kishore R, Jagannath, Mithal N, Pandey M, Patil DS
Applied Surface Science, 257(9), 4211, 2011
3 RF-PACVD of water repellent and protective HMDSO coatings on bell metal surfaces: Correlation between discharge parameters and film properties
Choudhury AJ, Barve SA, Chutia J, Pal AR, Kishore R, Jagannath, Pande M, Patil DS
Applied Surface Science, 257(20), 8469, 2011
4 Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition
Barve SA, Jagannath, Mithal N, Deo MN, Biswas A, Mishra R, Kishore R, Bhanage BM, Gantayet LM, Patil DS
Thin Solid Films, 519(10), 3011, 2011
5 Effect of impinging ion energy on the substrates during deposition of SiOx films by radiofrequency plasma enhanced chemical vapor deposition process
Choudhury AJ, Barve SA, Chutia J, Kakati H, Pal AR, Jagannath, Mithal N, Kishore R, Pandey M, Patil DS
Thin Solid Films, 519(22), 7864, 2011
6 Effect of argon ion activity on the properties of Y2O3 thin films deposited by low pressure PACVD
Barve SA, Jagannath, Deo MN, Kishore R, Biswas A, Gantayet LM, Patil DS
Applied Surface Science, 257(1), 215, 2010