화학공학소재연구정보센터
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No. Article
1 Tungsten allylimido complexes Cl-4(RCN)W(NC3H5) as single-source CVD precursors for WNxCy thin films. Correlation of precursor fragmentation to film properties
Bchir OJ, Green KM, Ajmera HM, Zapp EA, Anderson TJ, Brooks BC, Reitfort LL, Powell DH, Abboud KA, McElwee-White L
Journal of the American Chemical Society, 127(21), 7825, 2005
2 Tungsten nitride thin films deposited by MOCVD: sources of carbon and effects on film structure and stoichiometry
Bchir OJ, Green KM, Hlad MS, Anderson TJ, Brooks BC, McElwee-White L
Journal of Crystal Growth, 261(2-3), 280, 2004
3 Effect of NH3 on film properties of MOCVD tungsten nitride from Cl-4(CH3CN)W((NPr)-Pr-i)
Bchir OJ, Kim KC, Anderson TJ, Craciun V, Brooks BC, McElwee-White L
Journal of the Electrochemical Society, 151(10), G697, 2004
4 MOCVD of tungsten nitride (WNx) thin films from the imido complex Cl-4(CH3CN)W((NPr)-Pr-i)
Bchir OJ, Johnston SW, Cuadra AC, Anderson TJ, Ortiz CG, Brooks BC, Powell DH, McElwee-White L
Journal of Crystal Growth, 249(1-2), 262, 2003
5 Interfacial and intrafacial linkage isomerizations of rhenium complexes with aromatic molecules
Brooks BC, Meiere SH, Freidman LA, Carrig EH, Gunnoe TB, Harman WD
Journal of the American Chemical Society, 123(15), 3541, 2001