검색결과 : 12건
| No. | Article |
|---|---|
| 1 |
Electrical Evaluation of Process-Damaged Layers Using P-N-Junctions Yuda M, Kozen A Journal of Vacuum Science & Technology B, 15(3), 618, 1997 |
| 2 |
Influence of the Gas-Mixture on the Reactive Ion Etching of InP in CH4-H-2 Plasmas Feurprier Y, Cardinaud C, Turban G Journal of Vacuum Science & Technology B, 15(5), 1733, 1997 |
| 3 |
Plasma-Etching of III-V Semiconductors in BCl3 Chemistries .2. InP and Related-Compounds Lee JW, Hong J, Lambers ES, Abernathy CR, Pearton SJ, Hobson WS, Ren F Plasma Chemistry and Plasma Processing, 17(2), 169, 1997 |
| 4 |
High Ion Density Plasma-Etching of InGaP, Alinp, and AlGaP in CH4/H-2/Ar Lee JW, Pearton SJ, Santana CJ, Mileham JR, Lambers ES, Abernathy CR, Ren F, Hobson WS Journal of the Electrochemical Society, 143(3), 1093, 1996 |
| 5 |
High-Density Etching of Group-III Nitride Ternary Films Shul RJ, Howard AJ, Pearton SJ, Abernathy CR, Vartuli CB Journal of the Electrochemical Society, 143(10), 3285, 1996 |
| 6 |
High Microwave-Power Electron-Cyclotron-Resonance Etching of III-V Semiconductors in CH4/H-2/Ar Pearton SJ, Lee JW, Lambers ES, Mileham JR, Abernathy CR, Hobson WS, Ren F, Shul RJ Journal of Vacuum Science & Technology B, 14(1), 118, 1996 |
| 7 |
Treatment of InP Surfaces in Radio-Frequency H-2 and H-2/CH4/Ar Plasmas - In-Situ Compositional Analysis, Etch Rates, and Surface-Roughness Parmeter JE, Shul RJ, Howard AJ, Miller PA Journal of Vacuum Science & Technology B, 14(6), 3563, 1996 |
| 8 |
CH4/H-2/Ar Electron-Cyclotron-Resonance Plasma-Etching for GaAs-Based Field-Effect Transistors Vanhassel JG, Vanes CM, Nouwens PA, Maahury JH, Kaufmann LM Journal of the Electrochemical Society, 142(8), 2849, 1995 |
| 9 |
Plasma-Induced Damage of GaAs During Etching of Refractory-Metal Contacts Shul RJ, Lovejoy ML, Baca AG, Zolper JC, Rieger DJ, Hafich MJ, Corless RF, Vartuli CB Journal of Vacuum Science & Technology A, 13(3), 912, 1995 |
| 10 |
Plasma-Induced Damage of GaAs PN-Junction Diodes Using Electron-Cyclotron-Resonance Generated Cl-2/Ar, BCl3/Ar, Cl-2/BCl3/Ar, and Sicl4/Ar Plasmas Shul RJ, Lovejoy ML, Hetherington DL, Rieger DJ, Klem JF, Melloch MR Journal of Vacuum Science & Technology B, 13(1), 27, 1995 |