화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Atomic layer-deposited Al-HfO2/SiO2 bi-layers towards 3D charge trapping non-volatile memory
Congedo G, Wiemer C, Lamperti A, Cianci E, Molle A, Volpe FG, Spiga S
Thin Solid Films, 533, 9, 2013
2 Atomic Layer Deposition of Al-Doped ZrO2 Thin Films as Gate Dielectric for In0.53Ga0.47As
Lamagna L, Molle A, Wiemer C, Spiga S, Grazianetti C, Congedo G, Fanciulli M
Journal of the Electrochemical Society, 159(3), H220, 2012
3 Cubic/Tetragonal Phase Stabilization in High-kappa ZrO2 Thin Films Grown Using O-3-Based Atomic Layer Deposition
Lamperti A, Lamagna L, Congedo G, Spiga S
Journal of the Electrochemical Society, 158(10), G221, 2011
4 Pulsed plasma ion source to create Si nanocrystals in SiO2 substrates
Lorusso A, Nassisi V, Congedo G, Lovergine N, Velardi L, Prete P
Applied Surface Science, 255(10), 5401, 2009