| 1 |
Optical and photoelectrochemical studies on Ag2O/TiO2 double-layer thin films
Li C, Hsieh JH, Cheng JC, Huang CC
Thin Solid Films, 570, 436, 2014 |
| 2 |
AlNxOy thin films deposited by DC reactive magnetron sputtering
Borges J, Vaz F, Marques L
Applied Surface Science, 257(5), 1478, 2010 |
| 3 |
O- density measurements in the pulsed-DC reactive magnetron sputtering of titanium
Dodd R, You SD, Bradley JW
Thin Solid Films, 519(5), 1705, 2010 |
| 4 |
Synthesis and characterization of Al-N codoped p-type ZnO epitaxial films using high-temperature homo-buffer layer
Zhu QY, Ye ZZ, Yuan GD, Huang JY, Zhu LP, Zhao BH, Lu JG
Applied Surface Science, 253(4), 1903, 2006 |
| 5 |
P-type Zno thin films fabricated by Al-N co-doping method at different substrate temperature
Yuan GD, Ye ZZ, Qian Q, Zhu UP, Huang JY, Zhao BH
Journal of Crystal Growth, 273(3-4), 451, 2005 |
| 6 |
Effect of oxygen partial pressure ratios on the properties of Al-N co-doped ZnO thin films
Ye ZZ, Qian Q, Yuan GD, Zhao BH, Ma DW
Journal of Crystal Growth, 274(1-2), 178, 2005 |
| 7 |
Influence of Ar ion-beam assistance and annealing temperatures on properties of TiO2 thin films deposited by reactive DC magnetron sputtering
Kim SH, Hwangbo CK
Thin Solid Films, 475(1-2), 155, 2005 |
| 8 |
Effects of growth ambient on electrical properties of Al-N co-doped p-type ZnO films
Zhuge F, Zhu LP, Ye ZZ, Lu JG, Zhao BH, Huang JY, Wang L, Zhang ZH, Ji ZG
Thin Solid Films, 476(2), 272, 2005 |
| 9 |
Preparation of p-type ZnO films by Al plus N-codoping method
Ye ZZ, Fei ZG, Lu JG, Zhang ZH, Zhu LP, Zhao BH, Huang JY
Journal of Crystal Growth, 265(1-2), 127, 2004 |
| 10 |
Preparation and characteristics of p-type ZnO films by DC reactive magnetron sputtering
Ye ZZ, Lu JG, Chen HH, Zhang YZ, Wang L, Zhao BH, Huang JY
Journal of Crystal Growth, 253(1-4), 258, 2003 |
