1 |
Device scaling considerations for sub-90-nm 2-bit/cell split-gate flash memory cell Xu ZZ, Liu DH, Hu J, Chen WJ, Qian WS, Kong WR, Zou SC Solid-State Electronics, 152, 46, 2019 |
2 |
An in-depth analysis of temperature effect on DIBL in UTBB FD SOI MOSFETs based on experimental data, numerical simulations and analytical models Pereira ASN, de Steel G, Planes N, Haond M, Giacomini R, Flandre D, Kilchytska V Solid-State Electronics, 128, 67, 2017 |
3 |
A unified analytical drain current model for Double-Gate Junctionless Field-Effect Transistors including short channel effects Raksharam, Dutta AK Solid-State Electronics, 130, 33, 2017 |
4 |
Behavior of subthreshold conduction in junctionless transistors Park SJ, Jeon DY, Montes L, Mouis M, Barraud S, Kim GT, Ghibaudo G Solid-State Electronics, 124, 58, 2016 |
5 |
A high aspect ratio silicon-fin FinFET fabricated upon SOI wafer Liaw YG, Liao WS, Wang MC, Lin CL, Zhou B, Gu HS, Li DS, Zou XC Solid-State Electronics, 126, 46, 2016 |
6 |
A novel scaling theory for fully depleted pi-gate (Pi G) MOSFETs Chiang TK Solid-State Electronics, 103, 199, 2015 |
7 |
A threshold voltage model of short-channel fully-depleted recessed-source/drain (Re-S/D) UTB SOI MOSFETs including substrate induced surface potential effectsd Kumar A, Tiwari PK Solid-State Electronics, 95, 52, 2014 |
8 |
Drain bias effects on statistical variability and reliability and related subthreshold variability in 20-nm bulk planar MOSFETs Wang XS, Brown AR, Cheng BJ, Roy S, Asenov A Solid-State Electronics, 98, 99, 2014 |
9 |
Analytical model for ultra-thin body junctionless symmetric double gate MOSFETs in subthreshold regime Jazaeri F, Barbut L, Koukab A, Sallese JM Solid-State Electronics, 82, 103, 2013 |
10 |
Impact of quantum effects on the short channel effects of III-V nMOSFETs in weak and strong inversion regimes Dutta T, Rafhay Q, Clerc R, Lacord J, Monfray S, Pananakakis G, Boeuf F, Ghibaudo G Solid-State Electronics, 88, 43, 2013 |